- Nitrigen trifluoride chamber clean is used to provide fluorion or nitrogen tri fluoride source.
- Nitrogen trifluoride is a colorless , stable, and toxic gas
which has been used as a fluorine source for high energy chemical lasers,
it is prepared by fluorine because it is easy to handling at ambient
- Nitrogen trifluoride also used in the fluorination of fluorocarbon olefins.
- In semiconductor fabrication, nitrogen trifluoride is usefull for plasma or cleaning of CVD reactors.
- NF3 is also a selective reagent for silicon dioxide etching.